Journal of Siberian Federal University. Mathematics & Physics / Reduction of Boron Oxide on Polycrystalline Al and Sm Substrates

Full text (.pdf)
Issue
Journal of Siberian Federal University. Mathematics & Physics. Prepublication
Authors
Akashev, Lev A.; Korkh, Yulia V.; Popov, Nikolai A.; Kuznetsova, Tatiana V.; Konyukova, Alla V.; Shevchenko, Vladimir G.
Contact information
Akashev, Lev A. : Institute of Solid State Chemistry UB RAS Ekaterinburg, Russian Federation; Korkh, Yulia V. : M. N. Mikheev Institute of Metal Physics of the UB RAS Ekaterinburg, Russian Federation; Popov, Nikolai A. : Institute of Solid State Chemistry UB RAS Ekaterinburg, Russian Federation; OCRID: 0000-0002-4976-1295; Kuznetsova, Tatiana V. : M. N. Mikheev Institute of Metal Physics of the UB RAS Ekaterinburg, Russian Federation; Konyukova, Alla V. : Institute of Solid State Chemistry UB RAS Ekaterinburg, Russian Federation; Shevchenko, Vladimir G. : Institute of Solid State Chemistry UB RAS Ekaterinburg, Russian Federation
Keywords
thin film ellipsometry; Cauchy formula; boron oxide reduction
Abstract

This paper investigates the reduction of boron oxide deposited by vacuum thermal evap- oration on aluminum and samarium surfaces using optical methods of Raman spectroscopy (RS) and spectral ellipsometry. Raman peaks corresponding to vibrations of β-rhombohedral boron (β-B).were de- tected in the spectra of these samples. Spectral ellipsometry was used to determine the optical constants and thickness of the nanoscale boron film in the spectral range from 270 nm to 1000 nm

Pages
60–64
EDN
CLBQRT
Paper at repository of SibFU
https://elib.sfu-kras.ru/handle/2311/157924