Siberian Federal University 
- Issue
- Journal of Siberian Federal University. Mathematics & Physics. 2016 9 (4)
- Authors
- Solovev, Platon N.; Izotov, Andrey V.; Belyaev, Boris A.
- Contact information
- Solovev, Platon N.: Kirensky Institute of Physics SB RAS Akademgorodok, 50/38, Krasnoyarsk, 660036 Institute of Engineering Physics and Radio Electronics Siberian Federal University Svobodny, 79, Krasnoyarsk, 660041 Russia; ; Izotov, Andrey V.: Kirensky Institute of Physics SB RAS Akademgorodok, 50/38, Krasnoyarsk, 660036 Institute of Engineering Physics and Radio Electronics Siberian Federal University Svobodny, 79, Krasnoyarsk, 660041 Russia; ; Belyaev, Boris A.: Kirensky Institute of Physics SB RAS Akademgorodok, 50/38, Krasnoyarsk, 660036 Institute of Engineering Physics and Radio Electronics Siberian Federal University Svobodny, 79, Krasnoyarsk, 660041 Russia;
- Keywords
- film growth simulation; hysteresis loops; micromagnetic simulation; oblique deposition
- Abstract
The magnetization reversal processes in thin obliquely deposited films were studied by means of micro- magnetic modeling. Thin film structures for micromagnetic study were generated by Monte Carlo film growth simulator. Using obtained hysteresis loops for the generated films, we retrieved coercivity and remanent magnetization as a function of the deposition angle . The results showed that for films with < 65 ◦ the magnetization reversal occurred via coherent rotation of magnetic moments, whereas samples generated with larger deposition angles reverse their magnetization by the formation of complex quasi- domain magnetic structures. The numerical results are in a good accordance with the previously reported experimental measurements
- Pages
- 524–527
- Paper at repository of SibFU
- https://elib.sfu-kras.ru/handle/2311/30000
Journal of Siberian Federal University. Mathematics & Physics / Micromagnetic Simulation of Magnetization Reversal Processes in Thin Obliquely Deposited Films
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